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The growth and physical properties of low pressure chemically vapour-deposited films of tantalum silicide on n+-type polycrystalline silicon
A.E. Widmer, R. FehlmannVolume:
138
Year:
1986
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(86)90223-3
File:
PDF, 601 KB
english, 1986