Sputtering techniques applied to realization of ultrathin...

Sputtering techniques applied to realization of ultrathin layered stacks (of the order of nanometres): in situ ellipsometry control system

P Houdy, E Ziegler, L Névot
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Volume:
141
Year:
1986
Language:
english
Pages:
11
DOI:
10.1016/0040-6090(86)90323-8
File:
PDF, 570 KB
english, 1986
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