D.c. dielectric breakdown in SiO2 films prepared by low...

Thin Solid Films 1986 Vol. 143; Iss. 2

D.c. dielectric breakdown in SiO2 films prepared by low temperature chemical vapour deposition

C. Cobianu, C. Pavelescu
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Volume:
143
Year:
1986
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(86)90378-0
File:
PDF, 183 KB
english, 1986
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