Etching and deposition phenomena in an R.F. CH4 plasma
StanisŁaw Mitura, Leszek Klimek, ZdzisŁaw HaśVolume:
147
Year:
1987
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(87)90043-5
File:
PDF, 748 KB
english, 1987