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Control of the deposition temperature by the use of a magnetic field in r.f. sputtering
K. Ounadjela, G. Suran, J. SzternVolume:
151
Year:
1987
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(87)90138-6
File:
PDF, 326 KB
english, 1987