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On the properties of physically vapour-deposited Ti-Al-V-N coatings
O. Knotek, T. Leyendecker, F. JungblutVolume:
153
Year:
1987
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(87)90172-6
File:
PDF, 500 KB
english, 1987