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On the role of carrier gas in the deposition kinetics of SiO2 films produced by low temperature chemical vapour deposition
C. Cobianu, C. Pavelescu, E. SegalVolume:
146
Year:
1987
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(87)90220-3
File:
PDF, 394 KB
english, 1987