Microstructure of boron-doped silicon layers prepared by...

Thin Solid Films 1987 Vol. 150; Iss. 1

Microstructure of boron-doped silicon layers prepared by low pressure chemical vapour deposition

D. Bielle-Daspet, F. Mansour-Bahloul, A. Martinez, B. Pieraggi, M.J. David, B. De Mauduit, A. Oustry, R. Carles, G. Landa, F. Ajustron, A. Mazel, P. Riboulet
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Volume:
150
Year:
1987
Language:
english
Pages:
14
DOI:
10.1016/0040-6090(87)90309-9
File:
PDF, 1.34 MB
english, 1987
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