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Plasma enhanced chemical vapour deposition silicon nitride for microelectronic applications
Manju Gupta, V.K. Rathi, S.P. Singh, O.P. Agnihotri, K.S. ChariVolume:
164
Year:
1988
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(88)90154-x
File:
PDF, 174 KB
english, 1988