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Correlation between stress and structure in chemically vapour deposited silicon nitride films
A.G. Noskov, E.B. Gorokhov, G.A. Sokolova, E.M. Trukhanov, S.I. SteninVolume:
162
Year:
1988
Language:
english
Pages:
15
DOI:
10.1016/0040-6090(88)90201-5
File:
PDF, 872 KB
english, 1988