The effectiveness of chromium and TiW as diffusion barriers...

Thin Solid Films 1988 Vol. 162; Iss. none

The effectiveness of chromium and TiW as diffusion barriers for AuZn/Au contacts in InP junction field effect transistors

J.B. Boos, W. Kruppa, N.A. Papanicolaou
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
162
Year:
1988
Language:
english
Pages:
9
DOI:
10.1016/0040-6090(88)90204-0
File:
PDF, 548 KB
english, 1988
Conversion to is in progress
Conversion to is failed