Change in water vapour adsorption kinetics in chemically...

Thin Solid Films 1988 Vol. 161; Iss. none

Change in water vapour adsorption kinetics in chemically vapour deposited SiO2 films after ion irradiation

G.M. Tseytlin, A.G. Noskov, N.N. Gerasimenko, S.I. Stenin
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Volume:
161
Year:
1988
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(88)90266-0
File:
PDF, 431 KB
english, 1988
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