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High temperature stability of plasma-enhanced chemically vapour deposited titanium silicide due to two-step rapid thermal annealing
Tohru Hara, Yoshiro Ishizawa, Diederik G. Hemmes, Richard S. RoslerVolume:
157
Year:
1988
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(88)90354-9
File:
PDF, 421 KB
english, 1988