Low temperature growth of A1n and Al2O3 films by the simultaneous use of a microwave ion source and an ionized cluster beam system
Hiroshi Takaoka, Junzo Ishikawa, Toshinori TakagiVolume:
157
Year:
1988
Language:
english
Pages:
16
DOI:
10.1016/0040-6090(88)90355-0
File:
PDF, 827 KB
english, 1988