Metal-organic chemical vapor deposition of high-k...

Thin Solid Films 2013 / 06 Vol. 536

Metal-organic chemical vapor deposition of high-k dielectric Ce–Al–O layers from various metal-organic precursors for metal–insulator–metal capacitor applications

Abrutis, A., Lukosius, M., Skapas, M., Stanionyte, S., Kubilius, V., Wenger, Ch., Zauner, A.
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Volume:
536
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.03.045
Date:
June, 2013
File:
PDF, 990 KB
english, 2013
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