Electrical resistivity and structural changes in amorphous Ge1−xAlx thin films under thermal annealing
F. Catalina, C.N. Afonso, C. OrtizVolume:
167
Year:
1988
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(88)90481-6
File:
PDF, 806 KB
english, 1988