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Mechanical stresses in low pressure chemically vapour deposited silicon films
V.M. Koleshko, V.F. Belitsky, I.V. KiryushinVolume:
165
Year:
1988
Language:
english
Pages:
11
DOI:
10.1016/0040-6090(88)90689-x
File:
PDF, 868 KB
english, 1988