![](/img/cover-not-exists.png)
Deposition of tin-doped indium oxide films by a modified reactive magnetron sputtering process
A.A. Karim, C. Deshpandey, H.J. Doerr, R.F. BunshahVolume:
172
Year:
1989
Language:
english
Pages:
11
DOI:
10.1016/0040-6090(89)90122-3
File:
PDF, 568 KB
english, 1989