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Atomic structure of amorphous Si1−xCx films prepared by r.f. sputtering
Yoshihumi Suzaki, Shozo Inoue, Isao Hasegawa, Kumayasu Yoshii, Hideaki KawabeVolume:
173
Year:
1989
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(89)90139-9
File:
PDF, 485 KB
english, 1989