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Germanium diffusion and strain relaxation in Si/Si1−xGex/Si structures
G.F.A. Van De Walle, L.J. Van Ijzendoorn, A.A. Van Gorkum, R.A. Van Den Heuvel, A.M.L. Theunissen, D.J. GravesteijnVolume:
183
Year:
1989
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(89)90443-4
File:
PDF, 429 KB
english, 1989