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Hydrogen-terminated silicon substrates for low-temperature molecular beam epitaxy
P.J. Grunthaner, F.J. Grunthaner, R.W. Fathauer, T.L. Lin, M.H. Hecht, L.D. Bell, W.J. Kaiser, F.D. Schowengerdt, J.H. MazurVolume:
183
Year:
1989
Language:
english
Pages:
16
DOI:
10.1016/0040-6090(89)90445-8
File:
PDF, 1.12 MB
english, 1989