Comparison of the properties of TiSi2 films obtained by...

Thin Solid Films 1989 Vol. 170; Iss. 1

Comparison of the properties of TiSi2 films obtained by silicon and titanium co-sputtering and by composite target sputtering

H. Koster, S. Meiser, L. Niewohner, I. Lombaert, J.P. Manaud, Y. Danto
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Volume:
170
Year:
1989
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(89)90623-8
File:
PDF, 555 KB
english, 1989
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