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Comparison of the diffusion barrier properties of tungsten films prepared by hydrogen and silicon reduction of tungsten hexafluoride
O. Thomas, A. Charai, F.M. D'Heurle, T.G. Finstad, R.V. JoshiVolume:
171
Year:
1989
Language:
english
Pages:
15
DOI:
10.1016/0040-6090(89)90641-x
File:
PDF, 946 KB
english, 1989