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Oxynytride layers obtained by anodic oxidation of plasma-enhanced chemically vapour deposited Si3N4 films
I. Montero, O. Sa´nchez, J.M. Albella, J.C. PivinVolume:
175
Year:
1989
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(89)90807-9
File:
PDF, 265 KB
english, 1989