Amorphous silicon nitride thin films deposited using d. c....

Thin Solid Films 1990 Vol. 189; Iss. 1

Amorphous silicon nitride thin films deposited using d. c. discharge and post-discharge devices

J.L. Jauberteau, D. Conte, M.I. Baraton, P. Quintard, J. Aubreton, A. Catherinot
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
189
Year:
1990
Language:
english
Pages:
13
DOI:
10.1016/0040-6090(90)90032-9
File:
PDF, 614 KB
english, 1990
Conversion to is in progress
Conversion to is failed