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On the breakdown statistics of very thin SiO2 films

On the breakdown statistics of very thin SiO2 films

J. Suñé, I. Placencia, N. Barniol, E. Farrés, F. Martín, X. Aymerich
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Volume:
185
Year:
1990
Language:
english
Pages:
16
DOI:
10.1016/0040-6090(90)90098-x
File:
PDF, 865 KB
english, 1990
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