Generation and annihilation of thermal donors in silicon...

Thin Solid Films 1990 Vol. 187; Iss. 1

Generation and annihilation of thermal donors in silicon thin films formed by oxygen implantation

F. Vettese, J. Sicart, J.L. Robert, S. Cristoloveanu, J. Margail, C. Jaussaud
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Volume:
187
Year:
1990
Language:
english
Pages:
12
DOI:
10.1016/0040-6090(90)90123-u
File:
PDF, 606 KB
english, 1990
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