The effects of ion implantation on the electrical and compositional properties of tin oxide thin films
F.C. Stedile, C.V. Barros Leite, W.H. Schreiner, I.J.R. BaumvolVolume:
190
Year:
1990
Language:
english
Pages:
13
DOI:
10.1016/0040-6090(90)90135-z
File:
PDF, 764 KB
english, 1990