Activation energies in chemical vapour deposition kinetics...

Thin Solid Films 1990 Vol. 190; Iss. 1

Activation energies in chemical vapour deposition kinetics of SiO2 films using TEOS chemistry

Cristian Pavelescu, Irina Kleps
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Volume:
190
Year:
1990
Language:
english
Pages:
1
DOI:
10.1016/0040-6090(90)90140-9
File:
PDF, 176 KB
english, 1990
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