Influence of the technological parameters on the growth of a-Si:H by a low pressure d.c. plasma process
J.C. Delgado, J. Andreu, G. Sardin, J.L. MorenzaVolume:
191
Year:
1990
Language:
english
Pages:
13
DOI:
10.1016/0040-6090(90)90380-v
File:
PDF, 2.83 MB
english, 1990