Steep doping profiles obtained by low-energy implantation of arsenic in silicon MBE layers
N. Djebbar, J. Gutierrez, H. Charki, A. Vapaille, G. Prudon, J.C. DupuyVolume:
184
Year:
1990
Language:
english
Pages:
9
DOI:
10.1016/0040-6090(90)90395-t
File:
PDF, 389 KB
english, 1990