Limited reaction processing: Growth of Si1−xGex/Si for heterojunction bipolar transistor applications
J.L. Hoyt, C.A. King, D.B. Noble, C.M. Gronet, J.F. Gibbons, M.P. Scott, S.S. Laderman, S.J. Rosner, K. Nauka, J. Turner, T.I. KaminsVolume:
184
Year:
1990
Language:
english
Pages:
14
DOI:
10.1016/0040-6090(90)90402-y
File:
PDF, 736 KB
english, 1990