Low temperature formation of Si/silicide/Si double heterostructures by self-aligned MBE growth
T. Ohsima, N. Nakamura, K. Nakagawa, M. MiyaoVolume:
184
Year:
1990
Language:
english
Pages:
8
DOI:
10.1016/0040-6090(90)90423-b
File:
PDF, 561 KB
english, 1990