D.c. dielectric breakdown in phosphosilicate glass films...

Thin Solid Films 1990 Vol. 186; Iss. 1

D.c. dielectric breakdown in phosphosilicate glass films prepared by low temperature chemical vapour deposition

Daniel Serghi, Cristian Pavelescu
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Volume:
186
Year:
1990
Language:
english
Pages:
1
DOI:
10.1016/0040-6090(90)90518-i
File:
PDF, 193 KB
english, 1990
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