Stoichiometry and impurities in sputtered alumina films on copper
P. Vuoristo, T. Mäntylä, P. Kettunen, R. LappalainenVolume:
204
Year:
1991
Language:
english
Pages:
15
DOI:
10.1016/0040-6090(91)90071-5
File:
PDF, 1.01 MB
english, 1991