Process characterization with d.c. magnetron sputtering of...

Thin Solid Films 1991 Vol. 201; Iss. 1

Process characterization with d.c. magnetron sputtering of CrSiC thin films in ArCH4 mixtures

Gerhard Sobe, Antje Neelmeijer, Günter Weise, Armin Heinrich
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Volume:
201
Year:
1991
Language:
english
Pages:
14
DOI:
10.1016/0040-6090(91)90159-u
File:
PDF, 622 KB
english, 1991
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