Controlled index of refraction silicon oxynitride films...

Thin Solid Films 1991 Vol. 206; Iss. 1-2

Controlled index of refraction silicon oxynitride films characterized by variable angle spectroscopic ellipsometry

Yi-Ming Xiong, Paul G. Snyder, John A. Woollam, G.A. Al-Jumaily, F.J. Gagliardi, Eric R. Krosche
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Volume:
206
Year:
1991
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(91)90430-6
File:
PDF, 451 KB
english, 1991
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