Reluctant etchability of dielectric Al2O3 films sputtered in water vapor and ArO2 environments
Lynne M. Gignac, Subhash H. RisbudVolume:
202
Year:
1991
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(91)90544-8
File:
PDF, 1.09 MB
english, 1991