Determination of stoichiometry of SiOx thin films using an...

Thin Solid Films 1992 Vol. 213; Iss. 2

Determination of stoichiometry of SiOx thin films using an Auger parameter

R. Alfonsetti, L. Lozzi, M. Passacantando, P. Picozzi, S. Santucci
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Volume:
213
Year:
1992
Language:
english
Pages:
2
DOI:
10.1016/0040-6090(92)90276-h
File:
PDF, 191 KB
english, 1992
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