Ellipsometric study of metal-organic chemically vapor...

Thin Solid Films 1992 Vol. 220; Iss. 1-2

Ellipsometric study of metal-organic chemically vapor deposited III–V semiconductor structures

Samuel A. Alterovitz, Patricia A. Sekula-Moise, Robert M. Sieg, Mark N. Drotos, Nancy A. Bogner
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Volume:
220
Year:
1992
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(92)90579-z
File:
PDF, 563 KB
english, 1992
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