Plasma-enhanced chemically vapour deposited Si3N4 thin films for optical waveguides
J.M. Gonzálvez, R.G. Luna, M. Tudanca, O. Sánchez, J.M. Albella, J.M. Martínez-DuartVolume:
220
Year:
1992
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(92)90590-8
File:
PDF, 397 KB
english, 1992