Influence of process parameters on the size of the bias-nucleated area for diamond deposition with plasma-enhanced chemical vapour deposition
Lorenz, Hans Peter, Schilling, WolfgangVolume:
6
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(96)00583-3
Date:
January, 1997
File:
PDF, 934 KB
english, 1997