Effect of hydrogen on hot electron energy relaxation in SiO2 and Si3N4 films
D.G. Esaev, V.M. Efimov, A.A. ShklyaevVolume:
221
Year:
1992
Language:
english
Pages:
6
DOI:
10.1016/0040-6090(92)90810-x
File:
PDF, 490 KB
english, 1992