Irregular film thickness distribution in C4F8 inductively...

Microelectronic Engineering 2012 / 10 Vol. 98

Irregular film thickness distribution in C4F8 inductively coupled plasma polymer deposition

Volland, Burkhard E., Hauguth, Maik, Ishchuk, Valentyn, Rangelow, Ivo W., Goodyear, Andrew L.
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.07.058
Date:
October, 2012
File:
PDF, 372 KB
english, 2012
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