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Mechanisms of low temperature epitaxial silicon growth using ArF excimer laser photochemical vapor deposition from disilane
B Fowler, S Lian, S Krishnan, L Jung, C Li, D Samara, I Manna, S BanerjeeVolume:
218
Year:
1992
Language:
english
Pages:
10
DOI:
10.1016/0040-6090(92)90902-n
File:
PDF, 969 KB
english, 1992