Growth and dielectric characterization of yttrium oxide...

Thin Solid Films 1993 Vol. 226; Iss. 1

Growth and dielectric characterization of yttrium oxide thin films deposited on Si by r.f.-magnetron sputtering

W.M. Cranton, D.M. Spink, R. Stevens, C.B. Thomas
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Volume:
226
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(93)90222-b
File:
PDF, 396 KB
english, 1993
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