Kinetics of TiSi2 thin film formation at a single-crystal...

Kinetics of TiSi2 thin film formation at a single-crystal silicon surface by Ti ion irradiation

E.I. Bogdanov, L.N. Larikov, E.A. Maximenko, V.I. Franchouk
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Volume:
226
Year:
1993
Language:
english
Pages:
5
DOI:
10.1016/0040-6090(93)90377-2
File:
PDF, 463 KB
english, 1993
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