IR study of plasma-nitrided thermal SiO2 and pure silicon

IR study of plasma-nitrided thermal SiO2 and pure silicon

E.D. Atanassova, L.I. Popova, D.I. Kolev
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Volume:
224
Year:
1993
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(93)90450-4
File:
PDF, 594 KB
english, 1993
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