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Properties of titanium and aluminum thin films deposited by collimated sputtering
D. Liu, S.K. Dew, M.J. Brett, T. Janacek, T. Smy, W. TsaiVolume:
236
Year:
1993
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(93)90681-e
File:
PDF, 629 KB
english, 1993