Properties of titanium and aluminum thin films deposited by...

Properties of titanium and aluminum thin films deposited by collimated sputtering

D. Liu, S.K. Dew, M.J. Brett, T. Janacek, T. Smy, W. Tsai
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Volume:
236
Year:
1993
Language:
english
Pages:
7
DOI:
10.1016/0040-6090(93)90681-e
File:
PDF, 629 KB
english, 1993
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