Electrodeposition of metals into porous silicon

Thin Solid Films 1995 Vol. 255; Iss. 1-2

Electrodeposition of metals into porous silicon

M. Jeske, J.W. Schultze, M. Thönissen, H. Münder
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Volume:
255
Year:
1995
Language:
english
Pages:
4
DOI:
10.1016/0040-6090(94)05605-d
File:
PDF, 343 KB
english, 1995
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